发明名称 METHOD AND APPARATUS FOR PROCESSING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To suppress watermarking as much as possible, and also reduce the usage of organic solvent such as IPA and the like, by changing from hydrophobicity to hydrophilicity the property of a substrate surface at least part of which liquid is attached to before the same is dried without allowing the entire substrate to be dried. Ž<P>SOLUTION: An exposed region where the liquid is removed from the substrate surface by spraying liquid screening-out gas to part of the region of the substrate surface to which the liquid is attached is formed, or the exposed region from which the liquid is removed is formed on the part of the substrate surface by suctioning the part of the liquid of the substrate surface. Thereafter, the property of the substrate surface disposed on the exposed region is changed from the hydrophobicity to hydrophilicity by spraying plasma containing gas to the exposed region. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010177543(A) 申请公布日期 2010.08.12
申请号 JP20090020147 申请日期 2009.01.30
申请人 EBARA CORP 发明人 YAMAUCHI KAZUO;O CHIKAAKI
分类号 H01L21/304;H01L21/027 主分类号 H01L21/304
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