发明名称 SILVER-CONTAINING ALLOY PLATING BATH AND METHOD FOR ELECTROLYTIC PLATING USING SAME
摘要 Disclosed is a silver-containing alloy plating bath which can provide a silver-containing alloy plated product having excellent oxidation resistance and suitable for electronic members, decorative members and dental members. Also disclosed is an electrolytic plating method using the silver-containing alloy plating bath. Specifically, the plating bath is used for depositing a silver-containing alloy on the surface of a base, and contains (a) a silver compound containing 99.9-46% by mass of silver base on the total mass of the metals contained in the plating bath, (b) a gadolinium compound containing 0.1-54% by mass of gadolinium base on the total mass of the metals contained in the plating bath, (c) at least one complexing agent and (d) a solvent. The electrolytic plating method uses this plating bath. A silver-containing alloy plated product having excellent oxidation resistance can be obtained by the plating bath and the electrolytic plating method.
申请公布号 CA2751684(A1) 申请公布日期 2010.08.12
申请号 CA20092751684 申请日期 2009.02.06
申请人 DEWAKI, KENJI;DEWAKI, SHINJI;M-TECH JAPAN CO., LTD. 发明人 DEWAKI, KENJI;MATSUURA, TERU;DEWAKI, SHINJI
分类号 C25D3/64;C25D3/56 主分类号 C25D3/64
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