PROJECTION OPTICAL SYSTEM, EXPOSURE METHOD, AND EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a projection optical system which is used in order to expose a substrate with high throughput without enlarging a stage system of exposure equipment.

SOLUTION: There is provide a projection optical system PL for projecting an image of a pattern provided on a first surface onto a second surface. The projection optical system includes a dual partitioning optical system 50 for dividing illumination light IL from the pattern into two illumination light ILA and ILB and an image forming optical system 51 for leading the two illumination light ILA and ILB to two exposure regions 18A and 18B of the second surface and forming the image of the pattern on the exposure regions 18A and 18B.

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