发明名称 |
ELECTROPLATING METHODS AND CHEMISTRIES FOR DEPOSITION OF COPPER-INDIUM-GALLIUM CONTAINING THIN FILMS |
摘要 |
<p>Described is an electrodeposition solution for deposition of a Group IB-IIIA thin film on a conductive surface. In a preferred embodiment, the electrodeposition solution comprises a solvent; a Group IB material source that dissolves in the solvent and provides a Group IB material; a Group IHA material source that dissolves in the solvent and provides a Group IIIA material; and a blend of at least two complexing agents, one of the at least two complexing agent forming a complex with the Group IB material and the other one of the at least two complexing agent forming a complex with the Group IIIA material; wherein the pH of the solution is at least 7.</p> |
申请公布号 |
WO2010091369(A1) |
申请公布日期 |
2010.08.12 |
申请号 |
WO2010US23517 |
申请日期 |
2010.02.08 |
申请人 |
SOLOPOWER, INC. |
发明人 |
AKSU, SERDAR;WANG, JIAXIONG;BASOL, BULENT |
分类号 |
C25D5/10;H01L31/032 |
主分类号 |
C25D5/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|