发明名称 Solid-state imaging device, method of fabricating solid-state imaging device
摘要 Disclosed is a solid-state imaging device receiving incident light from a backside thereof. The imaging device includes a semiconductor layer on which a plurality of pixels including photoelectric converters and pixel transistors are formed, a wiring layer formed on a first surface of the semiconductor layer, a pad portion formed on a second surface of the semiconductor layer, an opening formed to reach a conductive layer of the wiring layer, and an insulating film extendedly coated from the second surface to an internal sidewall of the opening so as to insulate the semiconductor layer.
申请公布号 EP2081229(A3) 申请公布日期 2010.08.11
申请号 EP20090000727 申请日期 2009.01.20
申请人 SONY CORPORATION 发明人 AKIYAMA, KENTARO
分类号 H01L27/146;H01L27/14;H04N5/335;H04N5/357;H04N5/369;H04N5/374 主分类号 H01L27/146
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