发明名称 PROCESS OF MAKING AN OPTICAL FILM BY ATOMIC LAYER DEPOSITION (ALD) AT ATMOSPHERIC PRESSURE
摘要 A process of making an optical film or optical array comprises: a) simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate; wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material; wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film; b) repeating step a) a plurality of times to produce a first thickness of a first film layer with a first optical property; wherein the process is carried out at or above atmospheric pressure; c) repeating steps a) and b) to produce a second film layer; and wherein the process is carried out substantially at or above atmospheric pressure.
申请公布号 EP2215283(A1) 申请公布日期 2010.08.11
申请号 EP20080833206 申请日期 2008.09.18
申请人 EASTMAN KODAK COMPANY 发明人 FEDOROVSKAYA, ELENA A.;FYSON, JOHN RICHARD;COK, RONALD STEVEN
分类号 H01L51/52;C23C16/455;H01L27/32;H01L51/56 主分类号 H01L51/52
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