发明名称 |
PROCESS OF MAKING AN OPTICAL FILM BY ATOMIC LAYER DEPOSITION (ALD) AT ATMOSPHERIC PRESSURE |
摘要 |
A process of making an optical film or optical array comprises: a) simultaneously directing a series of gas flows along elongated substantially parallel channels to form a first thin film on a substrate; wherein the series of gas flows comprises, in order, at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material; wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material to form the first thin film; b) repeating step a) a plurality of times to produce a first thickness of a first film layer with a first optical property; wherein the process is carried out at or above atmospheric pressure; c) repeating steps a) and b) to produce a second film layer; and wherein the process is carried out substantially at or above atmospheric pressure. |
申请公布号 |
EP2215283(A1) |
申请公布日期 |
2010.08.11 |
申请号 |
EP20080833206 |
申请日期 |
2008.09.18 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
FEDOROVSKAYA, ELENA A.;FYSON, JOHN RICHARD;COK, RONALD STEVEN |
分类号 |
H01L51/52;C23C16/455;H01L27/32;H01L51/56 |
主分类号 |
H01L51/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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