发明名称 |
Process for producing photoresist composition, filter, coater and photoresist composition |
摘要 |
A technique to acquire a photoresist composition which can reduce occurrence of defects of a resist pattern after development is provided. Further, a technique to obtain a photoresist composition having excellent storage stability characteristics as a resist solution (storage stability); and a technique to obtain a photoresist composition which reduces the change of sensitivity and resist pattern size after treatment almost completely are provided. A photoresist composition containing a resin component (A), an acid-generating component (B) for generating an acid under exposure, and an organic solvent (C) is passed through a first filter 2a equipped with a first membrane having zeta potential of more than −20 mV but no more than 15 mV in distilled water of pH 7.0. |
申请公布号 |
US7771911(B2) |
申请公布日期 |
2010.08.10 |
申请号 |
US20050536047 |
申请日期 |
2005.05.20 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
HADA HIDEO;IWAI TAKESHI;SHIMAZAKI MASAAKI;MUROI MASAAKI;ATSUCHI KOTA;TOMIDA HIROAKI;OZAKI HIROKAZU |
分类号 |
G03C1/00;B01D61/14;B01D61/58;B01D69/02;B01D71/26;B01D71/56;C02F1/44;C08F220/10;G03F7/039;G03F7/26;H01L21/027 |
主分类号 |
G03C1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|