发明名称 ION SOURCE WITH SUBSTANTIALLY PLANAR DESIGN
摘要 In certain example embodiments of this invention, there is provide an ion source including an anode (25) and a cathode (5). In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between the anode and cathode, there is less undesirable build-up on the anode and/or cathode during operation of the ion source so that the source can run more efficiently. Moreover, in certain example embodiments, an insulator (35) such as a ceramic or the like is provided between the anode and cathode.
申请公布号 CA2585176(C) 申请公布日期 2010.08.10
申请号 CA20052585176 申请日期 2005.11.07
申请人 GUARDIAN INDUSTRIES CORP. 发明人 LUTEN, HENRY A.;VEERASAMY, VIJAYEN S.
分类号 H01J27/14;H01J3/04;H01J37/08 主分类号 H01J27/14
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