发明名称 Gas preheater for chemical vapor processing furnace having circuitous passages
摘要 A gas preheater (10) includes an entrance plate (12) having a first side (14), a second side (16), at least one opening (18) connecting the first side (14) and the second side (16), and a plurality of walls (19) on the second side (16) having tops (21) spaced from the second side (16), the walls (19) defining at least one circuitous pathway (22e, 22f, 22g, 22h) on the second side (16) beginning at the at least one opening (18), and a diffuser plate (40) having a first side and a second side and a plurality of holes (42) between the first side and the second side, the diffuser plate first side defining with the entrance plate second side (16) and the plurality of walls (19) at least one circuitous passage along the at least one circuitous pathway (22e, 22f, 22g, 22h), the at least one circuitous pathway having a first portion (22e1) leading from the at least one opening (18) and a second portion (22e2) spaced from the at least one opening (18), wherein the holes (42) in the diffuser plate (40) overlie the circuitous passage second portion (22e2).
申请公布号 US7771194(B2) 申请公布日期 2010.08.10
申请号 US20060441208 申请日期 2006.05.26
申请人 HONEYWELL INTERNATIONAL INC. 发明人 CRESS JAMES JAY;MILLER BRIAN J.
分类号 F28F27/02 主分类号 F28F27/02
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