发明名称 Gate valve and substrate-treating apparatus including the same
摘要 A substrate-treating apparatus includes: a plurality of modules disposed along a first direction, each of the plurality of modules having an inner space containable a substrate; a transfer unit transferring the substrate among the plurality of modules, the transfer unit including at least one track disposed along the first direction and at least one movable transfer chamber moving along the at least one track; and a gate valve fixed to each of the plurality of modules and combined with the at least one movable transfer chamber, wherein the at least one movable transfer chamber is atmospherically isolated from an exterior while moving.
申请公布号 US7771150(B2) 申请公布日期 2010.08.10
申请号 US20060467492 申请日期 2006.08.25
申请人 JUSUNG ENGINEERING CO., LTD. 发明人 HUEGLER KLAUS
分类号 H01L21/677;B65G1/133 主分类号 H01L21/677
代理机构 代理人
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