Method of forming film pattern, film pattern, device, electro optic device, and electronic apparatus

摘要

A method of forming a film pattern by placing a functional liquid on a substrate, comprises: forming a bank on the substrate, wherein the bank corresponds to a region for forming the film pattern; placing the functional liquid in the region for forming the film pattern partitioned by the bank; and curing the functional liquid to form the film pattern; wherein the functional liquid is placed under conditions that a difference between an advancing contact angle and a receding contact angle of the functional liquid with a top surface of the bank is 10 degrees or more and that the receding contact angle is 13 degrees or more.