发明名称 |
SENSOR SYSTEM FOR SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PURPOSE: A sensor-system for a semiconductor manufacturing machine is provided to reduce electrical signal abnormalities including crowbar effect by matching the pull-up networks of a chamber controlling board and a central controlling unit. CONSTITUTION: A first rotating-substrate supporting unit is arranged in a first processing chamber(202). A second rotating-substrate supporting unit is arranged in a second processing chamber. A first sensor-line connects a first sensor with a first chamber board(208). A second sensor-line connects a second sensor with a second chamber board. A central controlling unit(210) determines the rotary speed for the first and the second rotating-substrate supporting units. A remote controlling system transmits controlling parameters to the central controlling unit. |
申请公布号 |
KR20100088589(A) |
申请公布日期 |
2010.08.09 |
申请号 |
KR20100009272 |
申请日期 |
2010.02.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SCHAUER RONALD VERN;DASCOLI RAPHAEL;BHARGAVA SHIVAN |
分类号 |
H01L21/02;H01L21/203 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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