| 摘要 |
<p>PURPOSE: A liquid treatment device is provided to prevent the dropping of a coating solution from a coating nozzle to a substrate where the coating solution is supplied. CONSTITUTION: A driving device is formed to be moved in a horizontal direction along a guide(55) which is installed to be extended in parallel to the arranging direction of the solution treatment part of a base(22). A controller sequentially moves a coating nozzle to the coating location of each solution treatment part according to the predetermined import order of a wafer in order to supply the coating solution to the wafer. The controller controls the driving device so that the coating nozzle waits in the central waiting location between a first solution treatment part and a third solution treatment part when the third solution treatment part is interposed between the first solution treatment part and the second solution treatment part.</p> |
