METHOD OF MANUFACTURING REFLECTIVE MASK BLANKS FOR EUV LITHOGRAPHY

摘要

A method of manufacturing EUV mask blanks which minimizes the occurrence of damage on the glass substrate surface or the electrostatic chuck surface, caused by the sandwiching of particles or other foreign matter between the electrostatic chuck and glass substrate.  The method of manufacturing EUV mask blanks is characterized in that the electrostatic chuck holding the glass substrate by attractive force comprises a lower dielectric layer formed from organic polymer film, an electrode part formed from a conductive material, and an upper dielectric layer formed from an organic polymer film in this order, and in that the electrode part includes a cathode and anode.