| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in both of solubility in an organic solvent and a coating property to a support, and also to provide a resist pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition is obtained by dissolving in an organic solvent (S) a base component (A) which exhibits increased solubility in an alkali developer under the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) contains a resin component (A1) having four kinds of specific constitutional units, and the component (S) contains 60-99 mass% of an alcoholic organic solvent (S1) and 1-40 mass% of at least one organic solvent (S2) selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, and cyclohexanone. <P>COPYRIGHT: (C)2010,JPO&INPIT |
