| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of correcting a photomask, in which diffuse reflection in a flaw portion on the backside can be prevented in an exposure process and even a flaw portion can be changed into transparent to the wavelength in a transfer process. <P>SOLUTION: The method of correcting the photomask includes steps of: applying a liquid glass 3 on a flaw 1a present on the backside of a photomask 1, the liquid glass to become a glass having a light transmittance of≥70% and a refractive index of at least 1.4 after cured; and curing the liquid glass 3. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
