发明名称 |
ELECTROOPTICAL DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To prevent contamination of a dielectric film constituting a storage capacitance upon manufacturing an electrooptical device. SOLUTION: The electrooptical device includes on a substrate (10): a pixel electrode (9); a conductive layer (35) disposed beneath the dielectric film (72) sandwiched between the pixel electrode (9) and a capacitance electrode (71); and an island-shaped connecting member (93a) which is formed so as to overlap a contact hole (33b) formed while passing through at least the pixel electrode (9) and the dielectric film (72) and reaching the surface of the conductive layer (35), and which electrically connects between the pixel electrode (9) and the conductive layer (35). COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010169912(A) |
申请公布日期 |
2010.08.05 |
申请号 |
JP20090012683 |
申请日期 |
2009.01.23 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ONO TATSUKI |
分类号 |
G02F1/1368;G09F9/30;H01L21/336;H01L29/786 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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