| 摘要 |
<p>An exposure apparatus (EX) comprises: an optical system (PL), which has an emergent surface (11) wherefrom exposure light (EL) emerges; a first surface (21), which is disposed at least partly around an optical path of the exposure light from the emergent surface; and a second surface (22), which is disposed at least partly around the first surface; and a first supply port (51), which is disposed at least partly around the first surface such that it faces in an outward radial direction with respect to an optical axis (AX) of the projection optical system, that supplies a first liquid (LQ1) to the second surface; wherein, during at least part of an exposure of a substrate, a front surface of the substrate (P) opposes the emergent surface, the first surface, and the second surface; and the substrate is exposed with the exposure light that emerges from the emergent surface and transits a second liquid between the emergent surface and the front surface of the substrate.</p> |
