| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having all of high sensitivity, high heat resistance, high transparency and high adhesiveness to a metal base material. <P>SOLUTION: The positive photosensitive composition contains: (a) a polysiloxane; (b) a naphthoquinone diazide compound; (c) at least one compound selected from (1) a phosphate having an organic group separated by acid or heat, and compounds represented by general formulas (2) and (3); and (d) a solvent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
