发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM |
摘要 |
An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
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申请公布号 |
US2010193711(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20100685835 |
申请日期 |
2010.01.12 |
申请人 |
WATANABE YUKIO;WAKABAYASHI OSAMU;FUJIMOTO JUNICHI;NISHISAKA TOSHIHIRO;SOMEYA HIROSHI;HOSHINO HIDEO |
发明人 |
WATANABE YUKIO;WAKABAYASHI OSAMU;FUJIMOTO JUNICHI;NISHISAKA TOSHIHIRO;SOMEYA HIROSHI;HOSHINO HIDEO |
分类号 |
G21K5/02 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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地址 |
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