发明名称 |
Radio Frequency Power Control System |
摘要 |
A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.
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申请公布号 |
US2010194195(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20090366274 |
申请日期 |
2009.02.05 |
申请人 |
MKS INSTRUMENTS, INC. |
发明人 |
COUMOU DAVID J.;EYERMAN PAUL;IORIATTI CARL;STENGLEIN WILLIAM;FISK, II LARRY J.;RADOMSKI AARON;PHAM RICHARD |
分类号 |
H02J3/00 |
主分类号 |
H02J3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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