APPARATUS FOR DRESSING A POLISHING PAD, CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

摘要

PURPOSE: A dressing device of a polishing pad, a chemical and mechanical polishing device and a method thereof are provided to prevent a dressing load by properly dressing the polishing pad. CONSTITUTION: A dresser driving shaft(32) rotates and moves up and down. A dresser flange(41) is combined with the dresser driving shaft and fixes a dressing member. A spherical bearing(45) is provided to the dresser flange. The dresser driving shaft leans to the dresser driving shaft. A spring device generates force against the tilting movement of the dressing member. The dresser flange includes a disk type upper dresser flange and a disk type lower dresser flange.