| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for plasma etching elongate features in a generally planar workpiece of a type located in a chamber. SOLUTION: The method includes etching a test workpiece 13 in a flat configuration in the chamber, determining the respective angle of a longitudinal portion of the features 16 relative to an axis passing orthogonally through the workpiece, and determining the curvature of the workpiece, which is required to reduce the angles, at least over a central portion of the workpiece, substantially to 0°. The method further includes processing a further workpiece of the same type whilst it is curved with the determined curvature. COPYRIGHT: (C)2010,JPO&INPIT |
