发明名称 SCANNING ELECTRON MICROSCOPE AND DRIFT CORRECTION METHOD OF SCANNING ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To achieve a drift correction method of a scanning electron microscope, in which a drift correction that does not require a long time at mapping is possible. SOLUTION: Electron beams are scanned from an origination coordinate to X direction (Step S201) and a drift correction is carried out using a reference image for drift correction (Step 202a). Electron beams 2 are scanned in -X direction and drift correction is carried out (Step S202b). Then, the electron beams are scanned from the origination coordinate to -Y direction and drift correction is carried out. Then, the electron beams are scanned in Y direction and drift correction is carried out (Step S202d). Thereafter, similarly, the electron beams are scanned in the X direction and the Y direction and drift correction is made for every one line. Provided that, scanning to the last Y direction is not carried out, because correction is already made by the drift correction so far carried out. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010170842(A) 申请公布日期 2010.08.05
申请号 JP20090012404 申请日期 2009.01.22
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIDARA SOJI;ITO HIROYUKI
分类号 H01J37/22;H01J37/28 主分类号 H01J37/22
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