| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transparent gas barrier thin film which is flexible, highly blocks moisture, is curable at low temperatures and easy to produce. <P>SOLUTION: The gas-barrier thin film comprises a substrate, a fixed layer formed on the surface of one side of the substrate, an inorganic oxide layer formed on the surface of the side of the fixed layer opposite to the substrate. The fixed layer includes a repeating unit expressed by formula -(SiO)<SB>n</SB>-, a repeating unit expressed by formula -(SiR<SB>1</SB>R<SB>2</SB>-NR<SB>3</SB>)<SB>m</SB>- and a silicon-containing organic inorganic composite copolymer containing not less than one repeating unit selected from the group consisting of chemical formula -[-Si(R<SB>4</SB>)(R<SB>5</SB>)-O-]p- and chemical formula -[-OSi(R<SB>6</SB>)-O-Si(R<SB>7</SB>)O-]q-, and has a degree of polymerization of 2-1,000,000 (wherein, n+m+r=1, 0<n<1, 0<m<1, 0<r<1, and r=p, q, or p+q). <P>COPYRIGHT: (C)2010,JPO&INPIT |
