发明名称 |
PERFORMING OPTICAL PROXIMITY CORRECTION BY INCORPORATING CRITICAL DIMENSION CORRECTION |
摘要 |
A solution for performing an optical proximity correction (OPC) process on a layout by incorporating a critical dimension (CD) correction is provided. A method may include separating the layout into a first portion and a second portion corresponding to the two exposures; creating a model for calculating a CD correction for a site on the first portion, the model corresponding to a topography change on the site due to the double exposures; implementing an OPC iteration for the fragment based on the model to generate an OPC solution for the first portion; and combining the OPC solution for the first portion with an OPC solution for the second portion to generate an OPC solution for the layout to generate a mask for fabricating a structure using the layout.
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申请公布号 |
US2010199256(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20100697556 |
申请日期 |
2010.02.01 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BURNS RYAN L.;BURNS SEAN D. |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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