发明名称 |
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND POLYMERIC COMPOUND |
摘要 |
A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).
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申请公布号 |
US2010196821(A1) |
申请公布日期 |
2010.08.05 |
申请号 |
US20100687430 |
申请日期 |
2010.01.14 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
DAZAI TAKAHIRO;SHIONO DAIJU;HIRANO TOMOYUKI;MATSUMIYA TASUKU;TAKESHITA MASARU |
分类号 |
G03F7/20;C08F220/26;C08F228/06;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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