| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a magnetic disk substrate that can reduce scratches and surface roughness of the substrate after polishing without sacrificing productivity, and a method for manufacturing the magnetic disk substrate using the polishing liquid composition. <P>SOLUTION: The polishing liquid composition includes a colloidal silica, water, an acid, and an oxidizing agent; wherein the colloidal silica satisfies all of the following requirements (a) to (d): (a) a sphericity ratio is 0.75-1; (b) surface roughness (SA1/SA2) calculated from a specific surface area (SA1) according to a sodium titration method and a specific surface area (SA2) converted from an average particle diameter (S2) obtained by observation with a transmission type electron microscope is at least 1.3; (c) the average particle diameter (S2) is 1-40 nm; (d) aΔCV value (ΔCV=CV30-CV90) is 0-10%, which is defined as a difference between a value (CV30) of CV (coefficient of variatin) measured at a detection angle of 30 degrees by a dynamic light scattering method and a CV value (CV90) measured at a detection angle of 90 degrees by the dynamic light scattering method. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
