发明名称 IN SITU FORMATION AND DEPOSITION OF PALLADIUM Pd(0) IN REACTORS
摘要 <p>The invention relates mainly to a process for the in situ generation of a catalyst (Pd(0)) and the deposition of said catalyst on the internal wall(s) of a glass, glass-ceramic or ceramic reactor. The invention further relates to a reactor, preferably a microfluidic device, as may be obtained by the in situ generation and deposition of palladium Pd(0) on its internal wall(s) carried out according to said process. The invention also globally concerns catalytic processes including said process.</p>
申请公布号 WO2010088462(A1) 申请公布日期 2010.08.05
申请号 WO2010US22504 申请日期 2010.01.29
申请人 CORNING INCORPORATED;HORN, CLEMENS, R.;CERATO-NOYERIE, CARINE 发明人 HORN, CLEMENS, R.;CERATO-NOYERIE, CARINE
分类号 B01J23/44 主分类号 B01J23/44
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