CURABLE COMPOSITION FOR TRANSFER MATERIAL AND UREA COMPOUND CONTAINING (METH)ACRYLOYL GROUP

摘要

Disclosed is a curable composition for a transfer material, which exhibits very good transferability in a nanoimprint process, while having a high selectivity between the dry etching rates by an argon gas and an oxygen gas. The curable composition for a transfer material is suitable for a nanoimprint process, and enables the formation of a fine pattern at a high throughput. Specifically, the curable composition for a transfer material is characterized by containing a compound (A) that has at least one skeleton selected from a group consisting of formulae (1)-(3), and a (meth)acryloyl group.