| 摘要 |
PROBLEM TO BE SOLVED: To provide an EUV light source device capable of effectively generating EUV light, by maintaining a density of a high temperature plasma material as high as possible when discharge is generated between electrodes. SOLUTION: Laser is radiated from a laser source 23a on molten tin 11a adhered to a rotating electrode 11 to evaporate tin. Alternatively, high-voltage pulses are applied from a pulse power generator 8 on rotating electrodes 11, 12 to have discharge generated, high temperature plasma formed, and EUV light radiated. Here, a beam-converging point is so set to be further toward a rear side than a surface of the material 11a adhered to the rotating electrode 11. In other words, the surface of the material is so arranged at a position further shifted toward a light-incident side than the beam-converging point P of the laser 23. With this arrangement, plasma generated by the energy beams is to be with less free expansion than a prior art, and a density of gas of the plasma material in a discharge area can be maintained in a high state. COPYRIGHT: (C)2010,JPO&INPIT |
