发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus that ensures traceability while acquiring useful data for finding the cause of abnormal discharge in plasma treatment. <P>SOLUTION: The plasma processing apparatus executes plasma treatment while storing a substrate 9 in a treatment chamber 3a. The device includes: a discharge detection sensor 23 for detecting abnormal discharge inside the treatment chamber 3a; and a camera 26 that photographs the inside of the treatment chamber 3a via a window 2a so as to output moving-image data. When the abnormal discharge is detected, the moving-image data corresponding to the time zone including the detection time of the abnormal discharge is stored. When the abnormal discharge is not detected, data of moving images or still images showing a normal discharge state is stored as normal history image data indicating that plasma treatment is executed. By this arrangement, it is possible to ensure traceability while acquiring useful data for finding the cause of the abnormal discharge. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010170928(A) 申请公布日期 2010.08.05
申请号 JP20090013993 申请日期 2009.01.26
申请人 PANASONIC CORP 发明人 NONOMURA MASARU;HAJI HIROSHI;ARITA KIYOSHI
分类号 H05H1/46;H01L21/304;H01L21/3065;H05H1/00 主分类号 H05H1/46
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