METHOD OF PROCESSING SYNTHETIC QUARTZ GLASS SUBSTRATE FOR SEMICONDUCTOR

摘要

PURPOSE: A method for machining synthetic quartz glass panels for a semiconductor is provided to reduce scratches due to grinding using a small processing tool and to process a synthetic quartz glass panel with high planarity using a simple and low cost method. CONSTITUTION: A method for machining synthetic quartz glass panels for a semiconductor is as follows. A grinding unit of a small rotary machining tool(2) is contacted to the contact surface of synthetic quartz glass panels for a semiconductor. A polish processor rotates to polish the surface of a substrate. The number of rotation of the processing tool is 100~10,000 RPM. The working pressure of the processing tool is 1~100 g / mm.