PATTERN GENERATION METHOD, AND PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To reduce poor charge failure of a pattern and suppress lowering of throughput in imprint lithography.

SOLUTION: This method of generating an uneven pattern is provided as a method of forming patterns in which uneven patterns in a template are filled with resist materials, and the depth of the uneven pattern formed in the template is adjusted or the uneven pattern is divided based on the relation between the size or shape of the uneven pattern and the charge time of the resist material.

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