| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently control a rotationally asymmetric component in imaging characteristics in the case where the light amount distribution of exposure light transmitting at least some of optical members of a reticle and a projection optical system is rotationally asymmetric. <P>SOLUTION: In a method for exposure including irradiating a reticle having a transferring pattern formed thereon with exposure light, and exposing a wafer to the exposure light through the reticle and a projection optical system, before at least a part of the surface of a lens 32 of the projection optical system is irradiated with non-exposure light LBA to LBH having a wavelength region different from that of the exposure light, the light amount of the non-exposure light is monitored, and the irradiation amount of the non-exposure light on the at least a part of the surface of the lens 32 is controlled based on the monitoring result. <P>COPYRIGHT: (C)2010,JPO&INPIT |
