| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a drawing apparatus which can draw an intended pattern based on pattern data even if a light emitting element array is inclined, or light emitting elements are not normally located in the light emitting element array. Ž<P>SOLUTION: The drawing apparatus includes a table for mounting a substrate, a head for irradiating the substrate with light by a light emitting element array having a plurality of light emitting elements, a stage moving mechanism for relatively moving the heads to the substrate, and a control unit. The control unit forms drawing data which show a light supplying element to supply light among the plurality of light supplying elements according to a relative position of the head to the substrate from pattern data drawn on the substrate, measures the difference between an ideal irradiating position of light emitted from the head and an actual irradiating position, corrects the drawing data according to the difference, and controls the light emitting element array based on the corrected drawing data. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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