发明名称 POLYORGANOSILOXANE GRAFT POLYMER AND PHOTOPOLYMERIZABLE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a graft polymer having a polyorganosiloxane structure, which is excellent in chemical resistance, wear resistance, and adhesion, has a good photo-curing property, is stable over time, and exerts a good photo-curing property without heat treatment after photoirradiation, and a photopolymerizable resin composition produced using the same. SOLUTION: A polyorganosiloxane graft polymer is used, which is prepared by binding a polyorganosiloxane structural unit and a structural unit having a repeating unit having a polymerizable double bond in the side chain via a sulfur atom. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010168509(A) 申请公布日期 2010.08.05
申请号 JP20090014146 申请日期 2009.01.26
申请人 MITSUBISHI PAPER MILLS LTD 发明人 FURUKAWA AKIRA
分类号 C08G77/28;C08F299/08 主分类号 C08G77/28
代理机构 代理人
主权项
地址