| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent deviation from a specification relating to optical characteristics of a mask blank, and to prevent a pattern defect in a transferred material. <P>SOLUTION: When a department of manufacturing mask blanks manufactures a mask blank by forming a thin film formed into a mask pattern on a transparent substrate for a mask blank and supplies the mask blank to a department of manufacturing masks, the department of manufacturing mask blanks presents the optical characteristic information of the transparent substrate for a mask blank (variation of transmittance) and the optical characteristic information of the mask blank (variation of the transmittance and/or variation of a phase difference) to the department of manufacturing masks. The optical characteristic information of the transparent substrate for a mask blank is presented from a department of a raw material processing department that manufactures transparent substrates for mask blanks to the department of manufacturing blanks. <P>COPYRIGHT: (C)2010,JPO&INPIT |
