发明名称 |
Contact lithography apparatus and method |
摘要 |
A contact lithography apparatus and a method use one or both of spacers and a mesa to facilitate pattern transfer. The apparatus and the method include one or both of a spacer that provides a spaced apart orientation of lithographic elements, such as a patterning tool and a substrate, when in mutual contact with the spacer and a mesa between the patterning tool and the substrate. The mesa supports a contact surface of one or both of the mold and the substrate. One or both of the spacers and the mesa may be non-uniform. One or more of the patterning tool, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.
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申请公布号 |
US7768628(B2) |
申请公布日期 |
2010.08.03 |
申请号 |
US20060548823 |
申请日期 |
2006.10.12 |
申请人 |
HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. |
发明人 |
WU WEI;WANG SHIH-YUAN;STEWART DUNCAN R.;WILLIAMS R. STANLEY;YU ZHAONING;PARK INKYU |
分类号 |
G03B27/02;G03B27/20;G03B27/22;G03B27/42;G03B27/58;H01L21/00 |
主分类号 |
G03B27/02 |
代理机构 |
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代理人 |
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地址 |
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