发明名称 Polymer compound, positive resist composition, and method of forming resist pattern
摘要 There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
申请公布号 US7767379(B2) 申请公布日期 2010.08.03
申请号 US20080204460 申请日期 2008.09.04
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 DAZAI TAKAHIRO;MORI TAKAYOSHI;SHIMIZU HIROAKI;OSHITA KYOKO
分类号 G03F7/004;C08F28/06 主分类号 G03F7/004
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