ELECTRODE SLURRY COMPOSITION COMPRISING WET-ETCHING REAGENT

摘要

PURPOSE: An electrode slurry composition comprising a wet-etching reagent is provided to increase the surface area of an electrode current collector by forming an electrode and an etching area on the surface of the electrode current collector, to multiply the adhesion of a current collector active material, and to reduce an additional etching process of the current collector. CONSTITUTION: An electrode slurry composition includes 1-5 wt% of a wet-etching reagent. The wet-etching reagent includes an oxidant and a complexing agent. The oxidant is selected from H_2O_2, H_5IO_6, or FeNO_3 and the wet-etching reagent includes 1-10 wt% of the oxidant. The complexing agent is organic acid. The wet-etching reagent contains 1-10 wt% of the organic acid. The pH of the electrode slurry composition has a range of 6-7.