| 摘要 |
PURPOSE: A processing apparatus is provided to process a plurality of substrates in one processing space which is composed of a plurality of chamber units. CONSTITUTION: A plurality of chamber units(25) of a vacuum chamber(20) includes through holes through which a substrate is inserted. Grooves are continuously formed around the opening of the through holes. Each chamber unit is closely fixed to the grooves using a sealing material(26). A processing space which is composed of the through holes is placed in a chamber body. A wall unit(22) seals one opening of the processing space. A cover unit(23) opens and closes the other opening of the processing space.
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