发明名称 SUSPENDED MONO-CRYSTALLINE STRUCTURE AND METHOD OF FABRICATION FROM A HETEROEPITAXIAL LAYER
摘要 Methods of fabricating a suspended mono-crystalline structure use annealing to induce surface migration and cause a surface transformation to produce the suspended mono-crystalline structure above a cavity from a heteroepitaxial layer provided on a crystalline substrate. The methods include forming a three dimensional (3-D) structure in the heteroepitaxial layer where the 3-D structure includes high aspect ratio elements. The 3-D structure is annealed at a temperature below a melting point of the heteroepitaxial layer. The suspended mono-crystalline structure may be a portion of a semiconductor-on-nothing (SON) substrate.
申请公布号 US2010187572(A1) 申请公布日期 2010.07.29
申请号 US20090360079 申请日期 2009.01.26
申请人 CHO HANS S;KAMINS THEODORE I 发明人 CHO HANS S.;KAMINS THEODORE I.
分类号 H01L29/267;H01L21/20 主分类号 H01L29/267
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