GAS SCRUBBING APPARATUS AND GAS SCRUBBING METHOD

摘要

A gas scrubbing apparatus and a gas scrubbing method are provided. The gas scrubbing apparatus of the present invention comprises a reaction tube whereinto reactant gas is introduced; a reactor that is connected with said reaction tube and turns said introduced reactant gas into plasma; and a water injection part that is used to inject water into the plasma in said reactor, enabling gas scrubbing to be performed very economically because the heat source of the plasma is used to vaporize water. Furthermore, because water is directly vaporized to scrub the reactant gas in the optimal region whereinto reactant gas plasma is discharged, the efficiency of gas scrubbing is also increased.