发明名称 |
PROCESS AND METHOD FOR MODIFYING POLYMER FILM SURFACE INTERACTION |
摘要 |
The invention provides a modification of a polymer film surface interaction properties. In this process a polymer carrier object is covered by a chemical composition, comprising photo-polymerizable compounds, photo-initiators or catalysts with the ability to initiate polymerization and semi-fluorinated molecules. The so-produced polymer mold contains semi-fluorinated moieties, which are predominantly located on the surface and on the surface near region of the patterned surface. The polymer mold is suitable as a template with modified properties in a nano-imprint lithography process. (Figure 2) |
申请公布号 |
SG162673(A1) |
申请公布日期 |
2010.07.29 |
申请号 |
SG20090080805 |
申请日期 |
2009.12.04 |
申请人 |
OBDUCAT AB |
发明人 |
KEIL, MATTHIAS KEIL;NILSSON, JAKOB;RING, JOHAN;HEIDARI, BABAK |
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