| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a topcoat composition that is arranged on a resist film, protects the resist film, and has an appropriate developer solubility. <P>SOLUTION: The topcoat composition for photoresist contains a fluorine-containing polymer having a repeating unit represented by general formula (5). In the formula, R<SP>1</SP>represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. Also, n is 0 or 1, and m is an integer of 1 to (3+n). R<SP>2</SP>or R<SP>3</SP>represents a hydrogen atom or a protecting group. <P>COPYRIGHT: (C)2010,JPO&INPIT |
