PHOTOMASK BLANK, METHOD FOR ALIGNING PHOTOMASK, AND METHOD FOR MANUFACTURING DOUBLE-SIDED PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a photomask blank in which front and back faces are aligned with high accuracy.

SOLUTION: The photomask blanks has: a transparent substrate 100; an alignment mark 130 for aligning the front and the back faces, the mark formed as a concave on a first major face 110 of the transparent substrate 100; a light-shielding film layer 121 formed on a second major face 120 different from the first major face 110 of the transparent substrate 100; and a resist film layer 122 formed on the light-shielding film layer 121.

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