发明名称 ALIGNMENT DEVICE FOR VACUUM VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide an alignment device for vacuum vapor deposition, which is manufactured at a low cost and can keep a highly precise positioning performance. SOLUTION: This alignment device has: a substrate holder 11 that is held in the upper part of a mask which is held in a vacuum vessel 3, through a hanging member 12 which is inserted in a through-hole 1b formed in an attachment flange 1a of the vacuum vessel; a tabular body 13 for connection, which is arranged outside the vacuum vessel and also is connected to the hanging member; a positioning means 14 which can adjust the position of a substrate in a vapor-deposition chamber 2 held by the substrate holder with respect to the mask, by moving the tabular body for connection; a telescoping type cylindrical shielding member 15 which fits the outer periphery of the hanging member and also is arranged between the outer periphery of the through-hole of the attachment flange and the tabular body for connection to isolate the vacuum side from the atmosphere side; and an air-pressure cylinder 61 which is arranged between the tabular body for connection and the attachment flange, and generates a biasing force that is equivalent to a pressing force working onto the tabular body for connection, which is generated by a vacuum state of the inner side of the cylindrical shielding member, in a direction reverse to the direction of the pressing force. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010163692(A) 申请公布日期 2010.07.29
申请号 JP20100091018 申请日期 2010.04.12
申请人 HITACHI ZOSEN CORP 发明人 OKADA TOSHIYUKI;KIKUCHI MASAHIRO
分类号 C23C14/24;C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/24
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