发明名称 Optical storage medium comprising a mask layer with a super resolution near field structure
摘要 The optical storage medium according to the invention uses a mask layer as a super resolution near field structure, which comprises a doped semiconductor material. The semiconductor material is n-doped particularly such that the reflectivity of the semiconductor material is increased, when irradiated with a laser beam. As a semiconductor material advantageously an indium alloy and as a doping material selenium or tellurium can be used. For the manufacturing of a respective optical storage medium a sputtering method for depositing the doped semiconductor material as the mask layer can be used, wherein the dopant is included already in the semiconductor sputtering target.
申请公布号 US2010189950(A1) 申请公布日期 2010.07.29
申请号 US20070311716 申请日期 2007.10.11
申请人 FERY CHRISTOPHE;VON RIEWET LARISA;PILARD GAEL;KNAPPMANN STEPHAN 发明人 FERY CHRISTOPHE;VON RIEWET LARISA;PILARD GAEL;KNAPPMANN STEPHAN
分类号 G11B7/24;C23C14/34;G11B7/257;G11B7/2578 主分类号 G11B7/24
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