| 发明名称 |
CONDUCTIVE SEAL RING ELECTROSTATIC CHUCK |
| 摘要 |
<p>The present invention provides an improved electrostatic chuck for a substrate processing system. The electrostatic chuck comprising a main body having a top surface configured to support the substrate, a power supply to apply a voltage to the main body and a sealing ring disposed between the main body and the substrate wherein the sealing ring has a conductive layer.</p> |
| 申请公布号 |
WO2010085466(A1) |
申请公布日期 |
2010.07.29 |
| 申请号 |
WO2010US21466 |
申请日期 |
2010.01.20 |
| 申请人 |
PLASMA-THERM, LLC;REYNOLDS, GLYN |
发明人 |
REYNOLDS, GLYN |
| 分类号 |
H01L21/00;C23F1/00;H01L21/02;H01L21/68 |
主分类号 |
H01L21/00 |
| 代理机构 |
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